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Plused Laser Deposition System

  • PLD / Laser MBE System
  • PLD / Laser MBE System
  • PLD / Laser MBE System
PLD / Laser MBE SystemPLD / Laser MBE SystemPLD / Laser MBE System

PLD / Laser MBE System

  • Laser MBE System
  • Pulsed Laser Deposition System
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PLD

TSST Pulsed Laser Deposition systems for thin film growth are state-of-the-art, highly flexible PLD systems for thin film research, ideally suited and field proven for research on a large variety of materials including complex oxides.

System Characteristics:

• Thin film growth of highest quality complex materials

• Fully customized design, including adaptation to a specific lab layout

• Remote support, service and on site training by TSST engineers

• <10-7 mbar base pressure

• Up to 1000°C growth temperature

• Up to 6 targets for heterostructure growth


Laser MBE

TSST Advanced Pulsed Laser Deposition systems with in situ RHEED are state-of- the-art, highly flexible PLD systems for thin film research at atomic level, ideally suited and field proven for research on a large variety of materials including complex oxides.

System Characteristics:

• Thin film growth of highest quality complex materials

• Single monolayer growth control with RHEED

• Fully customised design, including adaptation to a specific lab layout

• Remote support, service and on site training by TSST engineers

• Down to 5.0x10-10 mbar base pressure

• Up to 1200°C growth temperature

• Up to 6 odd shaped targets for heterostructure growth