Pulsed Laser Deposition-PLD
TSST Pulsed Laser Deposition systems for thin film growth are state-of-the-art, highly flexible PLD systems for thin film research, ideally suited and field proven for research on a large variety of materials including complex oxides.
PLD working Principle:
System Characteristics:
• Thin film growth of highest quality complex materials
• Fully customized design, including adaptation to a specific lab layout
• Remote support, service and on site training by TSST engineers
• <10-7 mbar base pressure
• Up to 1000°C growth temperature
• Up to 6 targets for heterostructure growth
Laser Molecular Beam Epitaxy-LMBE
TSST Advanced Pulsed Laser Deposition systems with in situ RHEED are state-of- the-art, highly flexible PLD systems for thin film research at atomic level, ideally suited and field proven for research on a large variety of materials including complex oxides.
System Characteristics:
• Thin film growth of highest quality complex materials
• Single monolayer growth control with RHEED
• Fully customised design, including adaptation to a specific lab layout
• Remote support, service and on site training by TSST engineers
• Down to 5.0x10-10 mbar base pressure
• Up to 1200°C growth temperature
• Up to 6 odd shaped targets for heterostructure growth
LMBE System
Application:
Epitaxy growth(SrTiO3,LaAlO3)
Piezoelectrial thin film(PZT,AlN,BiFeO3,BaTiO3)
Ferroelectrical thin film(BaTiO3,KH2PO4)
Pyroelectrical thin film(SrTiO3)
Metal and Ionic contdutive thin film(Ti,Ag,Au,Pt,Ni,Co,SrRuO3,LaNiO3,YZrO2,GdCeO2,LaSrCoFeO3)
Semiconductor thin film(Zn(Mg)O,AlN,SrTiO3)
High K dielectrics(HfO2,CeO2,Al2O3,BaTiO3,SrTiO3,PbZrTiO3,LaAlO3,Ta2O5)
Superconducting thin film(YBa2CuO7-x,BiSrCaCuO)
Optical waveguide,optical thin film(PZT,AlN,BaTiO3,Al2O3,ZrO2,TiO2)
Superhydrophobic thin film(PTFE)
IR-detection thin film(V2O5,PZT)
Epitaxy Growth
Contact: Nana Zhang
Phone: 18201230727
Tel: 010-80698356
Email: Info@be-instruments.com
Add: Room 1310, AirChina Plaza, No. 36 Xiaoyun Road, Chaoyang District, Beijing