The OCTOPLUS 500 system has been developed for the growth of high quality III-V heterostructures on 4 inch Si substrates. Optionally the system can be upgraded to 6 inch substrate size. The MBE chamber is equipped with up to 11 effusion cells or gas injectors for deposition or surface treatment.
Based on many years of active research experience in the field of growth and doping applications with these elements our team develops and manufactures the OCTOPLUS 500 system and all essential components. Each product is assembled and carefully tested in-house.
The substrate manipulator applies pyrolytic graphite or alternatively tungsten or tantalum heaters. The OCTOPLUS 500 MBE system is field-proven and ideally suited for III/V, II/VI and other heterostructure growth for applications in research and production processes.
Outstanding features of the OCTOPLUS 500 are the high reliability and versatility of the system.
The standard version of the OCTOPLUS 500 comprises 11 radially arranged source ports, 3 further source ports can be added on request. A rapid pump-down load lock chamber with a horizontal working transfer rod system or a central transfer module allows easy substrate introduction without breaking the vacuum of the MBE chamber.
● 2“, 3“, 4“, 6“ or 7x2'' substrate size
● N2 lq cooling shroud
● <5x10-11 mbar base pressure
● 11 source flanges
● 3 additional sources on request
● III-V, II-VI or other materials
● RHEED, BFM, Quartz, Pyrometer etc.
● Soft-acting Rotary or Linear Shutters
We are happy to discuss your MBE system specifications and give competent advice for your application.
The OCTOPLUS 500 is in use in leading laboratories. On demand we transmit a detailed list of references. Please contact our sales department for further questions and specification information.
Add: Room 1310, AirChina Plaza, No. 36 Xiaoyun Road, Chaoyang District, Beijing